International Symposium on Applied Neuroscience and Neuropsychology (ISANN), founded by the Laboratory of Neuropsychology and Faculty of Social Sciences of The University of Hong Kong, is a biennial event that aims at enhancing understanding and promoting knowledge exchange about brain and behaviour relationships – the neural underpinnings of the many social cognitive affective processes happening in the brain that determines our behavioural presentation every moment of our lives.

In line with globalization of the University and the Faculty, since the inauguration symposium in 2007, our events have brought scientists from renowned research laboratories/ institutes from all over the world to Hong Kong. Research networks and clinical exchanges between Hong Kong and these laboratories/ institutes have been fostered. We are also committed to nurturing future scientists, and for this reason we have created opportunities that encourage dialogues between senior secondary students and scientists.

Following the success of our previous symposia, this year’s symposium titled “International Symposium on Applied Neuroscience and Neuropsychology 2011: Surfing the Socio-Affective Brain” will bring to you new and timely discoveries of brain processes underlying social behaviours and emotional presentations – interpersonal sensitivity, perceived social isolation, emotional consequence of social comparison, and the development of psychopathic traits. It is our greatest honour to have renowned scientists from Canada (Jorge Armony), Israel (Simone Shamay-Tsoory), the USA (James Blair, John Cacioppo, Jean Decety) speaking in this year’s symposium. We are also very glad to have three HKU research graduates to co-host a Forum titled “Affective world”.

We would like to extend to you our sincerest invitation to attend this year’s symposium. Your presence is the key to the success of the event.


Date: Monday October 3, 2011

Time: 9:00am

Venue: Council Chamber, 8/F, Meng Wah Complex, The University of Hong Kong

Online Registration
(Deadline for Registration: September 21, 2011)